Modeling of Chemical Vapor Deposition of Tungsten Films (Progress in Numerical Simulation for Microelectronics)
von
Chris R. Kleijn
Taschenbuch
Details (
Deutschland
)
ISBN: 978-3-0348-7743-5
ISBN-10: 3-0348-7743-9
Birkhäuser
· 2013
S. auch:
1993
Hardcover
Modeling of Chemical Vapor Deposition of Tungsten Films (Progress in Numerical Simulation for Microelectronics)