Device characterization of Dy-incorporated HfO2 gate oxide nMOS device: Device characteristics and reliability of DyO/HfO gate dielectrics and the application to NAND Flash memory

characteristics

von Tackhwi Lee

Taschenbuch

ISBN-13: 978-3-8443-9342-2

ISBN-10: 3-8443-9342-0

LAP LAMBERT Academic Publishing · 2011